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为了消除Rb蒸气室窗口内表面未镀膜引起的吸收率测量误差,本文提出采用差分吸收的方法准确测量高气压缓冲气体下Rb蒸气对780nm激光的吸收率,参考光源为787nm单管半导体激光器(LD)。吸收峰的测量,则通过观察780nm激光通过Rb蒸气室后激光光谱出现的凹陷确定。采用本文方法对充有252.5kPa He气和50.5kPa CH4缓冲气体的Rb蒸气的吸收率和吸收峰进行了测量,验证了该方法具有较高的测量精度。
In order to eliminate the measurement error of absorbency caused by the uncoated film on the inner surface of Rb steam chamber window, this paper proposes a differential absorption method to accurately measure the absorbance of 780 nm laser with Rb vapor under high pressure buffer gas. The reference light source is 787 nm single tube semiconductor laser (LD ). The measurement of the absorption peak is confirmed by observing the depression of the laser spectrum after the 780 nm laser passes through the Rb vapor chamber. The absorption and absorption peaks of Rb vapor filled with 252.5 kPa He gas and 50.5 kPa CH4 buffer gas were measured by this method. The results show that the proposed method has high accuracy.