论文部分内容阅读
目的:分析骨科无菌手术中不同抗菌药物(青霉素、环丙沙星、阿米卡星、氨苄西林、红霉素、妥布霉素、庆大霉素、头孢唑啉、诺氟沙星和万古霉素)对切口感染致病菌的耐药情况。方法:选取2014年8月—2016年11月间收治的骨科无菌手术患者104例,将其分成A组和B组,每组52例;A组患者于麻醉诱导期、术中和术后第3天给予抗菌药物预防感染,B组患者于术后到切口拆线时间内给予抗菌药物预防感染;比较两组患者预防感染用药后切口感染的发生率,以及致病菌的药敏试验结果。结果:A组患者用药后切口感染的发生率为3.85%低于B组为19.23%(P<0.05),未发生混合感染,而B组患者混合感染的发生率为7.69%(P<0.05);A组患者共培养出2株革兰阳性球菌,B组共培养出5株革兰阳性球菌和2株革兰阴性杆菌;分离出的致病菌对多种抗菌药物有耐药性。结论:骨科无菌手术患者在麻醉诱导期、术中和术后第3天采用抗菌药物预防感染,优于术后给药,但需注意的是不可任意延长抗菌药物的用药时间,以免提高感染的发生率和耐药性。
OBJECTIVE: To analyze the effects of different antimicrobial agents (penicillin, ciprofloxacin, amikacin, ampicillin, erythromycin, tobramycin, gentamicin, cefazolin, norfloxacin and Vancomycin) on the incision infection pathogenic bacteria resistance. Methods: A total of 104 patients undergoing orthopedic surgery between August 2014 and November 2016 were selected and divided into group A and group B, with 52 cases in each group. Patients in group A received anesthesia induction, intraoperative and postoperative On the third day, anti-bacterial drugs were given to prevent infection. Patients in group B were given antimicrobial drugs to prevent infection after the procedure was taken. The incidences of incisional infection and drug susceptibility test of pathogens were compared between the two groups . Results: The incidence of incision infection in group A was 3.85% lower than that in group B (19.23%, P <0.05), and no mixed infection was observed in group A, while the incidence of mixed infection in group B was 7.69% (P <0.05) ; A group of patients co-cultured two Gram-positive cocci, B group co-cultured five Gram-positive cocci and two Gram-negative bacilli; isolated pathogens resistant to a variety of antimicrobial agents. Conclusion: In the period of anesthesia induction, intraoperative and postoperative 3 days, antimicrobial agents are used to prevent infection in patients undergoing orthopedic asepsis surgery, which is superior to postoperative administration. However, it should be noted that antimicrobial drugs should not be prolonged in time to avoid infection The incidence and resistance.