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本文介绍了SC—50型金属工艺用离子注入机。主要讨论引出氮离子靶上达5mA 的改进潘宁型离子源,不对称三电极加速系统,具有旋转和升降机械扫描的大型靶室。
This article describes the SC-50 metal processing ion implanter. This paper mainly discusses the improved Penning ion source with 5mA on the target of nitrogen ion, asymmetric three-electrode accelerating system, large target chamber with rotating and lifting mechanical scanning.