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The application of transparent conducting indium-tin-oxide (ITO) film as full front electrode replacing the conventional bus-bar metal electrode in Ⅲ-V compound GalnP solar cell was proposed.A high-quality,non-rectifying contact between ITO and 10 nm N+-GaAs contact layer was formed,which is benefiting from a high carder concentration of the terrilium-doped N+-GaAs layer,up to 2× 1019 cm-3.A good device performance of the GaInP solar cell with the ITO electrode was observed.This result indicates a great potential of transparent conducting films in the future fabrication of larger area flexible Ⅲ-V solar cell.