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随着半导体工艺的发展,器件的速度越来越快,栅氧化层的厚度也越来越薄,因此如何对该工艺进行精确控制成为了保证器件性能的关键。本文主要介绍了在垂直式炉管上如何对该工艺进行管控。
With the development of semiconductor technology, the speed of devices is getting faster and the gate oxide thickness is getting thinner and thinner. Therefore, how to control the process accurately becomes the key to ensure the device performance. This article mainly introduces how to control the process on the vertical furnace tube.