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纳米硅薄膜具有独特的结构和许多优异的光电性能，可望应用于新型光电器件、大规模集成电路等领域。本文从制备技术、沉积机理、结构和性能各方面对纳米硅薄膜的研究进展情况作了回顾和综述，并对其发展前景作了展望
Nano-silicon thin film has a unique structure and many excellent optoelectronic properties, is expected to be used in new optoelectronic devices, large scale integrated circuits and other fields. In this paper, the progress of the research on nanosilica films is reviewed and summarized from the aspects of preparation technology, deposition mechanism, structure and performance, and the prospect of its development is also forecasted