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在纯Ar和Ar＋10％O2两种工作气体及不同基极偏压条件下，用射频溅射方法制备了Al2O3薄膜，测量了每个样品的内应力和密度，并对部分样品用X射线光电子谱进行了结构分析。结果表明，薄膜呈非晶态，薄膜的内应力均为压应力，并给出了气体种类和们压对膜的密度和应力的影响。
The Al2O3 films were prepared by radio frequency sputtering under the conditions of pure Ar, Ar + 10% O2 and different base bias. The internal stress and density of each sample were measured. Some samples were characterized by X-ray photoelectron spectroscopy Structural analysis was carried out. The results show that the film is amorphous, the internal stress of the film is compressive stress, and the influence of gas type and pressure on the density and stress of the film is given.