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用磁控溅射法制备了厚度20～200nm的NiFe合金薄膜。研究了热处理时间(及温度)对NiFe薄膜的电阻(电阻率)、各向异性磁电阻比和软磁性能的影响。在一定温度下,经适当时间的热处理可以减小NiFe薄膜的电阻、增大其各向异性磁电阻比,从而制备出性能较好(各向异性磁电阻比较大、温度稳定性较好)的薄膜磁性材料。
The thickness of 20 ~ 200nm NiFe alloy thin films were prepared by magnetron sputtering. The effect of heat treatment time (and temperature) on the resistance (resistivity), anisotropic magnetoresistance and soft magnetic properties of NiFe films was investigated. At a certain temperature, the heat treatment for a suitable time can reduce the resistance of the NiFe thin film and increase its anisotropic magnetoresistance ratio, so as to prepare better performance (anisotropic magnetoresistance is relatively large and temperature stability is good) Thin film magnetic material.