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讨论了制作大面阵矩底拱面状微透镜阵列的工艺条件，给出了氩离子束刻蚀制作红外焦平面用面阵微透镜的离子束刻蚀速率的经验关系式，通过实验获得了光电材料几种常用的氩离子束刻蚀速率与氩离子束能量之间的关系曲线，用扫描电子显微镜测量了所制微透镜阵列的微结构形貌特征。
The process conditions for fabricating a large array of bottom arched microlens arrays are discussed. The empirical relationship between the ion beam etching rate of an array of microlenses fabricated by argon ion beam lithography and the array microlenses used in infrared focal plane lithography is given. Several commonly used curves of argon ion beam etching rate and argon ion beam energy were used to measure the microstructural features of the fabricated microlens arrays by scanning electron microscopy.