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针对纳米级定位平台小型化和高定位精度的要求,基于体硅工艺研制出一种集结构、驱动和位移检测一体化的集成式微型纳米级xy定位平台.采用体硅双面深度反应离子刻蚀(DRIE)技术释放出高深宽比的静电梳齿驱动器、检测梁及定位平台结构.由于定位平台属于面内运动,为了提高面内运动位移检测的灵敏度提出了一种利用离子注入工艺和DRIE技术相结合制作检测梁侧壁压阻的方法,并利用该侧壁压阻工艺成功地把基于侧壁压阻式的位移传感器集成到微型xy定位平台上.实验测试表明,位移传感器的灵敏度优于1.17mV/μm,线形度优于0.814%,当驱动电压取30V时,定位平台的单轴输出位移可达±10μm,并且定位平台x方向和y方向上的位移耦合量非常小;在空气条件下测得定位平台的一阶固有频率为983Hz.
In order to meet the requirements of miniaturization and high positioning accuracy of nano-scale positioning platform, an integrated micro-nano xy positioning platform integrating structure, driving and displacement detection was developed based on bulk silicon technology. (DRIE) technology to release the high aspect ratio electrostatic comb drive, and to detect the structure of the beam and the positioning platform.Because the positioning platform belongs to the in-plane motion, in order to improve the sensitivity of in-plane motion detection, Technology to make the method to detect the piezoresistance of the side wall of the beam and to use the side wall piezoresistive technology to successfully integrate the piezoresistive displacement sensor based on the side wall into the miniature xy positioning platform.The experimental tests show that the sensitivity of the displacement sensor is excellent At 1.17mV / μm, the linearity is better than 0.814%. When the driving voltage is 30V, the uniaxial output displacement of the positioning platform can reach ± 10μm, and the displacement coupling of the positioning platform in the x direction and the y direction is very small. The first-order natural frequency of the positioning platform measured under the conditions of 983Hz.