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利用电子束扫描制造LSI光刻掩膜版,已取代从前的照像制版。在技术先进国家已进入实用化阶段。而电子束光栅扫描曝光机连续移动工作台的结构及精密轴承的精度和性能,决定于减少电子束的偏转角和工作台上下往返移动寸产生的位置误差。制造材料必须用热膨涨系数小,非磁性防止磁场变化。装配和加工技术要求精密微细化。电子束曝光机整体结构要真空密封,防止外界环境干扰。传动部分采用静压空气轴承、滚珠丝杠,滚柱轴承支持V型导轨等先进技术。
LSI lithography using electron beam scanning mask, has replaced the previous photographic plate. In advanced countries have entered the practical stage. The electron beam raster scanning exposure machine continuously moving table structure and precision bearings precision and performance, decided to reduce the deflection angle of the electron beam and the table up and down to move the inch position error. Materials must be made with thermal expansion coefficient is small, non-magnetic to prevent changes in the magnetic field. Assembly and processing technology requires precision micronization. E-beam exposure machine to vacuum the entire structure to prevent interference from the external environment. Transmission part of the static pressure air bearings, ball screws, roller bearings support V-rails and other advanced technologies.