Three-step lithography to the fabrication of vertically coupled micro-ring resonators in amorphous s

• 作 者: 程俊 严楠
• 机 构: School of Electromechanical Engineering, Beijing Institute of Technology,
• 出 处: Chinese Optics Letters
• 发表日期: 2015年08期
• 关键词: lithography vertically amorphous waveguide resonator etching fabrication fabrica

A simple method to fabricate vertically coupled micro-ring resonators in amorphous silicon-on-insulator is created by a three-step lithography process. First, the linear loss at 1.55 μm of the a-Si:H film is calculated to be 0.2 0.05 d B∕cm. Then, the bottom line waveguide of Su-8 with a flat top surface of 300 nm is created by etching. The thickness of Su-8 can easily be controlled by the etching time. Finally, by opening the window pattern and etching several layers, the first layer marks made by electron beam lithography are found with a50 nm resolution, and the high quality of the micro-ring resonator is demonstrated.

A simple method to fabricate vertically coupled micro-ring resonators in amorphous silicon-on-insulator is created by a three-step lithography process. First, the linear loss at 1.55 μm of the a-Si: H film is calculated to be 0.2 0.05 dB / cm. Then, the bottom line waveguide of Su-8 with a flat top surface of 300 nm is created by etching. The thickness of Su-8 can easily be controlled by the etching time. and etching several layers, the first layer marks made by electron beam lithography are found with a 50 nm resolution, and the high quality of the micro-ring resonator is demonstrated.