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利用射频磁控溅射制备了TiO_2致密薄膜,并通过退火实现TiO_2的相转变,采用扫描电镜,X射线衍射等手段对薄膜相结构进行表征并做了详细的分析。结果表明,退火后TiO_2薄膜结构致密,表面呈现出大小均匀的纳米晶粒。400℃退火时,TiO_2薄膜为单一的锐钛矿相,500~600℃退火时为锐钛矿和金红石混合相,700℃以上退火时则完全转变为金红石相。
The dense film of TiO_2 was prepared by radio frequency magnetron sputtering. The phase transition of TiO_2 was achieved by annealing. The phase structure of the film was characterized by scanning electron microscopy and X - ray diffraction. The phase structure of the film was characterized and analyzed in detail. The results show that the structure of TiO_2 thin films after annealing is dense and their surface shows uniform size of nanocrystalline grains. When annealed at 400 ℃, the TiO_2 film is a single anatase phase, with a mixture of anatase and rutile at 500-600 ℃ and rutile phase at 700 ℃.