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关于交联型聚甲基丙烯酸酯正性电子束抗蚀剂已有报道(1,2)。这种抗蚀剂是由共聚(甲基丙烯酸甲酯—甲基丙烯酰氯)和共聚(甲基丙烯酸甲酯—甲基丙烯酸)两种共
Cross-linked polymethacrylate positive electron beam resists have been reported (1, 2). This resist is a copolymer of (methylmethacrylate-methacryloyl chloride) and copoly (methylmethacrylate-co-methacrylic acid)