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真空镀膜过程中,由于材料的吸气放气及扩散泵抽速不稳,造成了真空室内气压的波动。这不仅会影响膜厚的质量而且在电子枪蒸镀中会因真空度过低而引起电子枪打火。在活化反应离子镀中因材料的吸气会使真空度过高而导致活化反应不稳定而影响膜厚的化合物组分。目前,为调节真空度,多使用针阀手调,但调节精度不高,反应时间慢。我们研制了一种自动调节气压的调节器,已用在我厂生产的DML-500A型离子镀机和
Vacuum coating process, due to the material of the inspiratory deflation and diffusion pumping speed instability, resulting in pressure fluctuations in the vacuum chamber. This not only affects the quality of the film thickness but also causes the electron gun to ignite due to the vacuum being too low during electron gun evaporation. In the reactive ion plating, the material composition of the compound will affect the film thickness due to instability of the activation reaction due to the vacuum of the material being too high. At present, to adjust the degree of vacuum, more use of needle valve hand, but the adjustment accuracy is not high, the reaction time is slow. We developed a regulator automatically adjust the air pressure, has been used in our factory production DML-500A ion plating machine and