论文部分内容阅读
离子注入机的总体设计方案可分为先加速后分析和先分析后加速两种。在电器安排方面,有的离子注入机设计为靶室接地,使离子源处于正高压;有的注入机设计为离子源接地,使靶室处于负高压;也有的注入机设计为中间的分析器接地,使离子源和靶室分别处于正负高压(这种设计较为少用)。不管采用那一种设计方法,总有一端为高压,那么这一端的电器设备就要处在高压上。我校研制的400KeV多元素离子注入机,是采取靶室接地,头部为400KV的正高压。因而,离子源电源、吸极电源、予加速电源、初
Ion implanter design of the overall program can be divided into the first after the first accelerated analysis and accelerated analysis of two. In the electrical arrangement, some ion implanter designed to target room ground, the ion source at a positive high pressure; some implanted machine designed to ion source ground, the target chamber at negative pressure; also some injectors designed as the middle of the analyzer Ground, so that the ion source and target chamber at positive and negative high pressure (this design is less used). No matter what kind of design method, there is always one end of the high pressure, then this end of the electrical equipment should be at high pressure. 400KeV multi-element ion implanter developed by our school is to take the target chamber ground, the head is 400KV positive high pressure. Thus, the ion source power supply, power supply, to accelerate the power supply, early