Current-Induced Reversible Resistance Jumps in La_(0.8)Ca_(0.2)MnO_3 Microbridge

• 作 者: 翟章印 解其云 陈贵宾 吴小山 高炬
• 机 构: Department of Physics,and Jiangsu Key Laboratory for Chemistry of Low-Dimensional Materials,Huaiyin
• 出 处: Chinese Physics Letters
• 发表日期: 2016年05期
• 关键词: excited spatially reversible lithography processed confined metastable currents

Two spatially confined La_(0.8)Ca_(0.2)MnO_3(LCMO) microbridges with different widths,starting from a single LCMO film(3mmx5mm),are fabricated by optical lithography.A second new and robust metal-insulator transition(MIT) peak at about 75 K appears,in addition to the normal MIT at 180 K observed in the standard LCMO film.When the two bridges are processed by currents of high densities,interesting reversible resistance jumps are excited only around the new peak.A stronger dependence of resistance jump on current excitation is found for the bridge with a smaller width.The temperature driven transition between new excited multiple metastable states are involved to explain the interesting low-temperature ultra-sharp jumps.

Two spatially confined La 0.8 Ca 0.2 MnO 3 (LCMO) microbridges with different widths, starting from a single LCMO film (3 mm × 5 mm), are fabricated by optical lithography. A second new and robust metal-insulator transition (MIT) peak at about 75 K appears, in addition to the normal MIT at 180 K observed in the standard LCMO film. When the two bridges are processed by currents of high densities, interesting reversible resistance jumps are excited only around the new peak. jump on current excitation is found for the bridge with a smaller width. The temperature driven transition between new excited multiple metastable states are involved to explain the interesting low-temperature ultra-sharp jumps.