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采用甚高频等离子体增强化学气相沉积技术,以SiH_4、CH_4和O_2作为反应气源,通过调控O2流量在250℃下制备强光发射的非晶SiC_xO_y薄膜。利用光致发光光谱、荧光瞬态谱、Raman光谱、X射线光电子能谱及红外吸收谱对薄膜的光学性质和微结构进行表征与分析,进而讨论其可调可见光发射机制。实验结果表明,SiC_xO_y薄膜发光性质与薄膜中的氧组分密切相关。随着薄膜中氧组分的增加,其发光峰位由橙红光逐渐向蓝光移动,肉眼可见强的可见光发射。荧光瞬态谱分析表明,薄膜的荧光寿命在纳秒范围。结合X射线光电子能谱和红外吸收谱对薄膜的相结构和化学键合结构进行分析,结果表明薄膜的主要相结构和发光中心随O_2流量的变化是其可调光发射的主要原因。
High-frequency plasma-enhanced chemical vapor deposition (PVDF) technology was used to fabricate strong light-emitting amorphous SiC_xO_y films by controlling the O2 flow rate at 250 ℃ using SiH_4, CH_4 and O_2 as reaction gas sources. The optical properties and microstructure of the films were characterized and characterized by photoluminescence spectroscopy, fluorescence transient spectroscopy, Raman spectroscopy, X-ray photoelectron spectroscopy and infrared absorption spectroscopy. Then the tunable visible light emission mechanism was discussed. The experimental results show that the luminescent properties of SiC_xO_y films are closely related to the oxygen content in the films. With the increase of the oxygen content in the film, the emission peak shifts from orange-red light to blue light, and the visible light emission is visible to the naked eye. Fluorescence transient spectroscopy analysis showed that the fluorescence lifetime of the film is in the nanosecond range. The phase structure and chemical bonding structure of the films were analyzed by X-ray photoelectron spectroscopy and infrared absorption spectroscopy. The results showed that the main phase structure and the change of the luminescence center with the O 2 flux are the main reasons for the tunable emission.