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电子束曝光,已成为超大规模集成电路的关键,最近竟像超大规模集成电路的代名词那样被使用。但是,代替原来紫外线曝光的电子束曝光,并不是根据国际商业机器公司的未来体制和因超大规模集成而出现的。把电子束应用于小形回路图形的试制,早在1950年后半年就已进行,但其实际应用还是在1965年之后,那时在日本的电气试验所(现称电子技术综合研究所)也已应用电子束进行集成电路的试制。当时,与国际商业机器公司和贝尔研究所(BTL)相比是比较先进的(参考文献1～3),因为它
Electron beam exposure, which has become the key to very large scale integrated circuits, was recently used as a synonym for very large scale integrated circuits. However, electron beam exposure, which replaces the original UV exposure, does not appear to be based on the future architecture of International Business Machines Corp. and the very large-scale integration. The application of electron beam to the manufacture of small circuit patterns was carried out as early as the second half of 1950, but its practical application was still after 1965, when the electrical test laboratory in Japan (now known as the Institute of Electronic Technology) Application of electron beam for trial production of integrated circuits. At the time, it was more advanced than the International Business Machines Corporation and the Bell Institute (References 1 to 3) because it