Application of UV depth lithography in micro system technology

• 作 者: Stephanus Büttgenbach Mar
• 机 构: InstituteforMicrotechnology
• 出 处: 光电子快报：英文版
• 发表日期: 2008年1期
• 关键词: 微系统技术 紫外线 平版印刷术 微电子学
• 基金项目: This work has been supported by the German Research Foundation and the Ministry of Economy, Labour and Transportation of Lower Saxony. Antrag GZ 398, Chinesisch-Deutsches Zentrum fiir Wissen schaftsfo

This letter reports on new types of photo resists allowing UV-light exposure of thick layers. Optimized processes Cthat for the positive resist AZ 9260 and the negative resist Epon SU-8 have been developed enabling the fabrication of high aspect ratio met