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针对作者发明的多离子束反应共溅射技术,基于气体动力学原理,在稳恒溅射情况下,建立了多离子束多靶反应共溅射的基本模型,获得了薄膜沉积速率和薄膜成分与反应共溅射工艺参数之间的关系.该模型揭示了影响薄膜成分的本质参量.基于该模型,提出了调控溅射速率及薄膜成分的途径与方法.
According to the multi-ion beam co-sputtering technique invented by the author, based on the principle of gas dynamics, a basic model of co-sputtering multi-ion beam multi-target reaction was established under the condition of steady sputtering. The deposition rate and film composition And the reaction co-sputtering process parameters.The model reveals the essential parameters that affect the composition of the film.Based on the model, the ways and methods of controlling the sputtering rate and the film composition are proposed.