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以ＮａＢＨ４为还原剂用化学沉积方法成功制备了钴硼合金功能膜。通过大量试验，优化出一种沉积速率较快的镀液配方与工艺。采用ＸＲＤ、ＴＥＭ等仪器对沉积膜的镀态结构和组织性能进行了测试，研究了合金的沉积速率与结构。试验获得的合金膜显微硬度较高，表面光亮致密，且与基体结合牢固；虽然ＸＲＤ的检测结果显示沉积膜为非晶态结构，ＴＥＭ的进一步分析表明，沉积膜是非晶态＋晶态的过渡态结构，从而对钴硼合金沉积膜作了较为全面的评价。
Cobalt-boron alloy functional films were successfully prepared by chemical deposition using NaBH4 as reductant. Through a large number of experiments, we have optimized a plating solution formulation and process with high deposition rate. The deposited structure and microstructure of the deposited films were tested by XRD, TEM and other instruments. The deposition rate and structure of the films were investigated. The alloy film obtained by the experiment has higher microhardness, brighter and glitter surface, and firm bonding with the substrate. Although the XRD results show that the deposited film is amorphous, further analysis by TEM shows that the deposited film is amorphous and crystalline Transition state structure, which made a more comprehensive evaluation of cobalt-boron alloy deposited film.