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真空导电膜已有广泛的应用。它可以用来赋予光学电介质表面高的导电性并消除这类表面上的水汽和静电荷。在化学稳定性差的材料(某些无色的和有色光学玻璃及晶体)上,经常需要镀真空导电膜。本文研究由SnO_2、In_2O_3和In_2O_3(10％SnO_2)组成的真空导电膜的保护性能。在新鲜的基片上镀SnO_2之后,在空气中于400℃加热3小时,而镀In_2O_3和In_2O_3(10％SiO_2)之后,则在350℃加热3小时,在上述导电膜的厚度≈0.25μm时,其表面比电阻依次为～10~4,10~3和3～5×10~2Ω。在用化学稳定性较差的基片(Tφ,Oφ,C3C,3C玻璃制的)时,SnO_2导电膜的保护性能不明显。
Vacuum conductive film has been widely used. It can be used to impart high electrical conductivity to optical dielectric surfaces and to eliminate moisture and electrostatic charge on such surfaces. Of chemically unstable materials (some colorless and colored optical glass and crystals), it is often necessary to apply a vacuum conductive film. In this paper, the protective properties of vacuum conductive films composed of SnO 2, In 2 O 3 and In 2 O 3 (10% SnO 2) were investigated. SnO 2 was plated on a fresh substrate, heated in air at 400 ° C. for 3 hours, and after In 2 O 3 and In 2 O 3 (10% SiO 2) were plated, the film was heated at 350 ° C. for 3 hours. When the thickness of the above conductive film was ≈0.25 μm, The surface specific resistance of ~ 10 ~ 4,10 ~ 3 and 3 ~ 5 × 10 ~ 2Ω. The protective properties of the SnO 2 conductive films are not obvious when the substrates with poor chemical stability (Tφ, Oφ, C3C, 3C glass) are used.