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提出了一种利用石墨纳米颗粒作为掩膜,通过金属辅助刻蚀来制备具有低反射率的太阳电池纳米陷光结构的方法。用该方法制得了一种表面覆盖有纳米线和纳米孔的太阳电池纳米陷光结构。结合金属辅助刻蚀的机制和这种陷光结构的形成原理,分析了石墨纳米颗粒和H2O2浓度对陷光结构形貌的影响,并讨论了陷光结构的形貌对样品陷光性能的影响。最后,制得了在300～1100nm波长范围内平均反射率仅为3.6%的太阳电池陷光层。
A method for preparing a solar cell nano-trapping structure with low reflectivity by using metal-assisted etching using graphite nano-particles as a mask is proposed. Using this method, a solar cell nanosubstance structure with a surface covered with nanowires and nanopores was obtained. Combined with the mechanism of metal assisted etching and the principle of formation of such a light-trapping structure, the influence of graphite nanoparticles and H2O2 concentration on the morphology of the light-trapping structure is analyzed. The effect of the morphology of the light-trapping structure on the light-trapping properties of the sample . Finally, a solar cell light-trapping layer having an average reflectance of only 3.6% in a wavelength range of 300 to 1100 nm was obtained.