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为了研究在高密度电法温纳装置条件下不同的层间隔的正演模型,得到层间距变化对高密度电阻率法响应的影响规律,分别建立了双层低阻采空区模型(模型Ⅰ)、双层高阻采空区模型(模型Ⅱ)、双层低高阻采空区模型(模型Ⅲ:低阻在上部,高阻在下部)、双层高低阻采空区模型(模Ⅳ型:高阻在上部,低阻在下部)。通过对比分析发现,高密度电阻率法对模型Ⅰ随着层间隔h的增加,不能把异常体的位置区分出来;对模型Ⅱ当2层高阻异常体间隔小于30 m时,不能有效的分辨双层异常体的位置,当层间隔大于40 m时能够有效的分辨出双层异常体的位置和范围;对模型Ⅲ均能显示出异常体的存在但纵向上的位置误差较大;模型Ⅳ能够把上层高阻下层低阻区分开,但不能准确确定下层低阻体的位置。
In order to study the forward modeling of different interlayer spacings under the condition of high-density electrical law Wenna apparatus, the influence of interlayer spacing on the response of high-density resistivity method was obtained. The model of double-layer low resistance goaf was established ), Double-layer high-resistance goaf model (modelⅡ), double-height low resistance goaf model (model Ⅲ: low resistance in the upper part and high resistance in the lower part) Type: high resistance in the upper part, low resistance in the lower part). Through comparative analysis, it is found that the high density resistivity method can not distinguish the position of the anomalous body with the increase of the layer interval h for model Ⅰ. When Model Ⅱ is less than 30 m, the interval of 2 layers of high resistivity anomaly can not be distinguished effectively The location of bilayered anomalous body can distinguish the location and range of bilayered anomalous body effectively when the interval is greater than 40 m. The model Ⅲ can show the existence of abnormal body but the longitudinal position error is larger. Model Ⅳ It is able to separate the low resistivity area of the upper high resistance layer from the low resistance area, but can not accurately determine the position of the lower low resistance body.