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本文对双离子束溅射淀积法制备的类金刚石碳膜进行了大气中的热退火研究。退火温度３００℃，时间分别为１．５ｈ和３．Ｏｈ．对退火前后的样品分别作了红外透射谱、Ｒａｍａｎ光谱和电阻率的测量，并在退火过程中对膜层电阻率进行了即位测量，结果表明，３００℃的退火并不能使膜层中的Ｃ—Ｈ键断裂，而使膜层结构趋于完整，膜层氧化变薄，其电阻率和红外透过率增高；但退火对膜的影响程度只与退火温度有关，而与退火时间无关。还观察到退火后膜层电阻性能的时效现象，并作了初步的解释。
In this paper, double-ion beam deposition deposited diamond-like carbon films were prepared by thermal annealing in the atmosphere. Annealing temperature 300 ℃, the time was 1.5h and 3. Oh. The samples before and after annealing were measured by infrared transmission spectrum, Raman spectrum and resistivity, respectively. During the annealing process, the resistivity of the film was measured as-is. The results show that annealing at 300 ℃ can not make the C -H bond rupture, leaving the film structure tends to be complete, thin film oxidation, the resistivity and infrared transmittance increased; but the impact of annealing on the film only with the annealing temperature, and has nothing to do with the annealing time. Also observed after annealing resistance properties of the film aging phenomenon, and made a preliminary explanation.