论文部分内容阅读
采用不同折射率的梯形棱镜作衬底,室温下用热蒸发或电子束蒸发的方法,在棱镜底面生长一系列金膜和银膜,使用椭圆偏振光谱方法分别测量了金属与空气界面及金属与衬底界面的介电函数谱.发现从金属-衬底界面处测到的薄膜介电函数谱不仅有别于金属-空气界面处测到的值,而且随衬底折射率的不同而改变.通过对这种现象进行分析,可解释为是由贵金属与相关介质接触时的内表面光学特性变化所引起,金属内表面的光学性质有别于体材料和膜材料的光学性质,而且强烈依赖于接触介质
A series of gold and silver films were grown on the bottom of the prism by using the trapezoid prism with different refractive index as the substrate and the thermal evaporation or electron beam evaporation at room temperature. The interface between the metal and the air and the interface between the metal and the metal were measured by ellipsometry Dielectric Function Spectrum of Substrate Interface. It is found that the dielectric permittivity spectrum measured at the metal-substrate interface is not only different from the value measured at the metal-air interface, but also varies with the refractive index of the substrate. The analysis of this phenomenon can be explained by the change of the optical properties of the inner surface when the noble metal is brought into contact with the relevant medium. The optical properties of the inner surface of the metal differ from the optical properties of the bulk material and the film material and are strongly dependent on Contact media