表面改性CeO_2基抛光粉在水介质中的悬浮稳定性

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CeO2基抛光粉在水介质中很容易沉淀,为提高CeO2料浆的抛光能力,氧化铈基抛光粉被表面改性。所用改性剂有六偏磷酸钠、十二烷基硫酸钠、十六烷基三甲基溴化铵、谷氨酸。用红外光谱分析仪、XRD、扫描电镜、激光粒度分析仪、Zeta电位、热重分析等对CeO2改性前后的物相组成、结构、颗粒大小、分散性、悬浮性和改性剂对CeO2的包裹率等进行表征,结果表明,阴离子改性剂十二烷基硫酸钠、阳离子改性剂十六烷基三甲基溴化铵和无机盐改性剂六偏磷酸钠能明显改善CeO2在水介质中的悬浮稳定性,两性离子改性剂谷氨酸对提高CeO2的悬浮稳定性的作用不明显;改性剂没有改变CeO2的物相组成和结构,仅粘附于CeO2的颗粒表面。CeO2悬浮液动力学试验表明,六偏磷酸钠对CeO2的黏附力最强,十六烷基三甲基溴化铵和十二烷基硫酸钠次之,氨基酸最弱。对玻璃材料的研磨试验结果表明,改性的CeO2颗粒(包裹体)有比较好的抛光效果,对玻璃材料去除率(MRR)的差异可能与改性剂的包裹率有关。在生产上,可以选用六偏磷酸钠作为CeO2基抛光粉的改性剂,且包裹率以不大于1.5%(质量分数)为宜。 CeO2-based polishing powder is easily precipitated in aqueous medium. In order to improve the polishing ability of CeO2 slurry, the cerium-based polishing powder is surface-modified. The modifiers used are sodium hexametaphosphate, sodium lauryl sulfate, cetyltrimethylammonium bromide, glutamic acid. The phase composition, structure, particle size, dispersibility, suspensibility and modifier of CeO2 before and after modification of CeO2 were characterized by infrared spectroscopy, XRD, SEM, laser particle size analyzer, Zeta potential, The results showed that the anionic modifier sodium dodecyl sulfate, cationic modifier cetyltrimethylammonium bromide and inorganic salt modifier sodium hexametaphosphate can significantly improve the CeO2 in water The suspending stability of the medium and the zwitterionic modifier glutamic acid have no obvious effect on increasing the suspension stability of CeO2. The modifier does not change the phase composition and structure of CeO2, and only adheres to the surface of CeO2 particle. CeO2 suspensions kinetics tests showed that sodium hexametaphosphate has the strongest adhesion to CeO2, followed by cetyltrimethylammonium bromide and sodium lauryl sulfate, with the weakest amino acids. The results of the grinding tests on the glass materials show that the modified CeO2 particles (inclusions) have a good polishing effect, and the differences in the MRR of the glass materials may be related to the modifier encapsulation rate. In the production, you can use sodium hexametaphosphate as a polishing agent CeO2-based modifier, and the package rate of not more than 1.5% (mass fraction) is appropriate.
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