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四氢化硅是一种常见的工业原料,是一种提供硅组分的重要气体源,可用于制造高纯度单晶硅、多晶硅、异质硅、微晶硅、非晶硅、氮化硅、氧化硅等各种硅化物。四氢化硅在临界温度256℃)和极高的压力下(96和120 GPa)可作为超导体使用〔1〕。由于四氢化硅的高纯度和能实现精细控制,已经成为许多其他硅源无法取代的重要特种气体〔2-3〕。四氢化硅的主要毒性是刺激作用,有研究显示它
Silicon hydride is a common industrial raw material and is an important gas source for providing silicon components. It can be used in the manufacture of high purity single crystal silicon, polycrystalline silicon, heterogeneous silicon, microcrystalline silicon, amorphous silicon, silicon nitride, Silicon oxide and other silicides. Silicon hydride at a critical temperature of 256 ° C) and very high pressure (96 and 120 GPa) can be used as a superconductor 〔1〕. Due to its high purity and fine control, silicon hydride has become an important specialty gas that can not be replaced by many other silicon sources [2-3]. The main toxicity of silicon hydride is stimulating effect, studies have shown it