论文部分内容阅读
采用电子束沉积的方法分别在K9玻璃、紫外熔凝石英和Si基片上制备了LaF3单层膜,研究了衬底温度对LaF3薄膜结构和光学性能的影响。衬底温度从200℃上升到350℃,间隔为50℃,用分光光度计测量样品的透射率光谱曲线,并进行光学常数的计算。利用原子力显微镜(AFM)进行表面粗糙度的标定,利用ZYGO干涉仪测量基板镀膜前后的面型变化,利用Stoney公式计算出残余应力。结果表明,在本实验条件下,薄膜的折射率和消光系数随衬底温度的升高而增大;随衬底温度的升高,均方根粗糙度先增大后减小,达到一定温度后,粗糙度迅速增大;残余应力为张应力,随衬底温度的升高而增加。
LaF3 monolayer films were prepared on K9 glass, UV fused silica and Si substrates respectively by electron beam deposition. The effects of substrate temperature on the structure and optical properties of LaF3 films were investigated. The substrate temperature was raised from 200 ° C to 350 ° C at 50 ° C intervals. The transmittance spectrum of the sample was measured with a spectrophotometer and the optical constants were calculated. The surface roughness was calibrated by atomic force microscope (AFM), the surface change before and after the substrate coating was measured by ZYGO interferometer, and residual stress was calculated by Stoney formula. The results show that under the experimental conditions, the refractive index and extinction coefficient increase with the increase of the substrate temperature. With the increase of the substrate temperature, the root mean square roughness first increases and then decreases to a certain temperature After the roughness increases rapidly; residual stress is tensile stress, with the substrate temperature increases.