Low-loss amorphous Si waveguides with gradient refractive index cladding structure

• 作 者: 邱伟彬 王加贤
• 机 构: College of Information Science and Engineering,Huaqiao University,
• 出 处: Chinese Optics Letters
• 发表日期: 2012年04期
• 关键词: cladding waveguide amorphous refractive fabrication roughness eliminated etching

Amorphous Si waveguides with gradient refractive index cladding structure are proposed and fabricated using plasma-enhanced chemical vapor deposition method.Compared with 6 dB/cm for ridge waveguide without gradient cladding,the propagation loss of the gradient cladding waveguides is less than 1 dB/cm with both TE and TM polarizations.

Amorphous Si waveguides with gradient refractive index cladding cladding structures are fabricated and fabricated using plasma-enhanced chemical vapor deposition method. Compared with 6 dB / cm for ridge waveguide without gradient cladding, the propagation loss of the gradient cladding waveguides is less than 1 dB / cm with both TE and polarizations.