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The implanted ion range, the depth profileand the film sttucture of the implanted layer werestudied; the carrier concentration and the mobilitywere measured; the conductivity mechanism of thefilm implanted Fe into Al_2O_3 ceramic was discussed.The conclusion is that the implanted Fe~(2+) ions moveinto Al_2O_3 lattice and replace Al~(3+) to form subs-titution impurities so that the ion implanted lat-tice, as compared with the original one, presentsan effective negative charge which forms a negativecharge center. A vacancy is bound arround it, andan acceptor is introduced in the forbidden band.
The implanted ion range, the depth profile and the film sttucture of the implanted layer were stamped; the carrier concentration and the mobility measure; the conductivity mechanism of the film implanted Fe into Al 2 O 3 ceramic was discussed. The conclusion is that the implanted Fe ~ (2+) ions moveinto Al_2O_3 lattice and replace Al ~ (3+) to form subs-titution impurities so that the ion implanted lat-tice, as compared with the original one, presentsan effective negative charge which forms a negativecharge center. A vacancy is bound arround it , andan acceptor is introduced in the forbidden band.