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DT—1连续电子束退火机是国内首次研制成功的电子束退火专用设备。具有功率大、控制功能多样、参数调节方便、性能稳定可靠的特点。为离子注入半导体的退火、浅结殴姆接触和硅化物的形成、非晶薄膜的处理、高Tc超导材料的制备以及金属表面淬火等方面的科学研究提供了一台新型的工艺设备。
DT-1 continuous electron beam annealing machine is the first successful development of electron beam annealing equipment. With large power, control functions and diverse, convenient parameter adjustment, stable and reliable performance characteristics. It provides a new type of process equipment for the scientific research of ion implantation semiconductor annealing, shallow junction ohmic contact and silicide formation, amorphous thin film processing, high Tc superconducting material preparation and metal surface hardening.