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采用双阴极封闭型非平衡磁场ｄｃ反应磁控溅射离子镀制备Ｃ３Ｎ４／ＴｉＮ复合交替膜，用Ｘ射线光电子能谱法分析了薄膜的组成，测量了薄膜的Ｘ射线衍射谱和氮化碳的透射电子衍射图像．氮化碳经氮化钛的强迫晶化作用，生成了βＣ３Ｎ４和ｃＣ３Ｎ４．
The C3N4 / TiN composite films were prepared by double-cathode closed-loop unbalanced magnetic field dc reactive magnetron sputtering. The composition of the films was analyzed by X-ray photoelectron spectroscopy. The X-ray diffraction spectra and carbon nitride Transmission electron diffraction images. Nitrided by titanium nitride forced crystallization of nitrogen generated β C3N4 and c C3N4.