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利用等效介质理论和严格耦合波理论研究比较微纳米级高深宽比深沟槽结构的红外反射谱,提出一种对等效折射率加入色散修正项的深沟槽结构反射率快速算法.通过超越色散方程分析和大量计算发现,加入的等效折射率色散修正项与波长的平方成反比,并且与深沟槽结构的材料、周期和占空比有关.这种新的计算方法可以非常精确地获得高深宽比深沟槽结构的反射率,而且明显提高了运算速度,在复杂深沟槽结构基于模型的红外反射谱测量中具有重要的应用价值,可以应用于微电子和微机电系统制造过程中高深宽比微纳深沟槽结构刻蚀进度的在线实时监测.
Based on the equivalent medium theory and the strict coupling wave theory, the infrared reflectance spectra of deep trench structures with high aspect ratio and high aspect ratio are compared and a fast reflectivity algorithm for deep trench structures with equivalent refractive index and dispersion correction is proposed. Beyond the dispersion equation analysis and extensive calculations, it has been found that the equivalent refractive index dispersion correction term added is inversely proportional to the square of the wavelength and is related to the material, period and duty cycle of the deep trench structure. This new calculation method can be very accurate To obtain the reflectivity of the deep trench structure with high aspect ratio and to improve the computing speed obviously. It has an important application value in the model-based infrared reflection spectrum measurement of complex deep trench structures and can be applied to the manufacturing of microelectronics and microelectromechanical systems Online Real-time Monitoring of Etch Progress of High Aspect Ratio Micro / nano Deep Trench Structure in Process.