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展示真实的工艺结论,介绍在基片本身或监控片上进行光学直接监控的方法应用于大面积(最大基片盘直径1400 mm)镀膜的成功经验。直接监控技术可以最快速的再现高难度的设计要求,保证大面积,高精度镀膜设备上的高成品率。文中列举的各类多层膜的实验结果清楚地证明了这种强大的监控手段的应用潜力。可使用直接监控方式镀膜的膜系包括截至滤光片,偏振膜,分光膜以及多腔带通滤光片。所有这些膜系都是在PIAD(等离子辅助沉积)和PARMS(等离子体辅助反应磁控溅射)的方式下完成的。实验的重复性和均匀性体现了直接监控的优势。在塑料基底上应用等离子体辅助工艺的关键在于调整离子源或等离子源本身。他们改变热度和等离子轰击的能力通常是工艺的关键因素,从而使工艺更适合于象塑料这样对温度和等离子轰击敏感的基材。
Showcasing real process results and introducing the successful experience of applying optical direct monitoring on the substrate itself or on a monitoring sheet to large area (maximum substrate disc diameter 1400 mm) coating. Direct monitoring technology can quickly reproduce the difficult design requirements, to ensure large area, high-precision coating equipment on the high yield. The experimental results of the various multilayer films enumerated in the article clearly demonstrate the potential of this powerful monitoring tool. Films that can be directly monitored include cut-off filters, polarizing films, spectroscopic films, and multi-cavity bandpass filters. All of these membrane systems are done in a PIAD (Plasma Assisted Deposition) and PARMS (Plasma Assisted Reactive Magnetron Sputtering) mode. The repeatability and uniformity of the experiment show the advantages of direct monitoring. The key to applying a plasma-assisted process to a plastic substrate is to adjust the ion source or the plasma source itself. Their ability to alter heat and plasma bombardment is often a critical process factor, making the process more suitable for substrates such as plastics that are sensitive to temperature and plasma bombardment.