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本文给出了当CuI含量为30mol%时CuI-Cu_2O-WO_3-P_2O_5系统的玻璃形成区。测量了样品的交流电导率,得出了电导率随WO_3含量变化规律。采用红外光谱、阻抗谱、径向分布函数(RDF)和扫描电子显微镜(SEM)等测试手段研究了该系统材料的结构,讨论了电学性能与结构的相互关系。
In this paper, the glass-forming region of CuI-Cu_2O-WO_3-P_2O_5 system is obtained when the CuI content is 30mol%. The AC conductivity of the sample was measured, and the conductivity variation with WO3 content was obtained. The structure of the system material was investigated by means of infrared spectroscopy, impedance spectroscopy, radial distribution function (RDF) and scanning electron microscopy (SEM). The relationship between the electrical properties and the structure was discussed.