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采用多弧离子镀技术,使用Ti-Al-Zr合金靶及Cr单质靶的组合方式,在W18Cr4V高速钢基体上制备TiAlZrCr/(Ti,Al,Zr,Cr)N四元梯度氮化物膜.利用SEM和XRD分析梯度膜的微观组织和结构,使用摩擦磨损试验机研究梯度膜在室温(15℃)和高温(500℃)下的耐磨损特性,并采用SEM观察磨痕形貌.结果表明,在不同沉积偏压下制备的四元梯度膜均具有fcc-Na Cl型的Ti N结构,其组织致密均匀,呈典型的柱状晶形态.梯度膜的摩擦磨损机理是以塑性变形为主要特征的黏着磨损,并伴有轻微的磨粒磨损.在室温和高温下磨损时的平均摩擦系数分别在0.25~0.30和0.30~0.35之间,且当沉积偏压增加至-200 V时,梯度膜的耐磨损性能实现最优化.
A TiAlZrCr / (Ti, Al, Zr, Cr) N quaternary gradient nitride film was prepared on a W18Cr4V high speed steel substrate by a combination of multi-arc ion plating and Ti-Al-Zr alloy and Cr single- SEM and XRD were used to analyze the microstructure and structure of the gradient film. The abrasion resistance of the gradient film at room temperature (15 ℃) and high temperature (500 ℃) was studied by using a friction and wear tester. The wear scar morphology was observed by SEM , The quaternary gradient films prepared under different depositional biases all have the fcc-Na Cl type TiN structure, and the structure is dense and uniform with typical columnar crystal morphology.The friction and wear mechanism of the gradient film is mainly characterized by plastic deformation Of the wear and tear, accompanied by a slight abrasive wear.At room temperature and high temperature wear average friction coefficient between 0.25 ~ 0.30 and 0.30 ~ 0.35, and when the deposition bias voltage increases to -200 V, the gradient film The wear resistance is optimized.