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首先扼要阐述了与金刚石薄膜制备技术有关的等离子体特性,随后着重介绍了金刚石薄膜制备技术的最新进展。根据沉积工艺参数和装置的结构评价了各种技术的优缺点。最后指出了目前这些技术中存在的问题。
First of all, the characteristics of the plasma related to the diamond film preparation technology are briefly described. Then, the latest progress of the diamond film preparation technology is emphatically introduced. The advantages and disadvantages of various technologies are evaluated according to the deposition process parameters and the structure of the device. Finally, the problems existing in these technologies are pointed out.