论文部分内容阅读
美国国家标准技术研究所和哈佛大学正在研究一种新的微细刻蚀方法,即用粒子束代替光束.热心于搞光刻的人也很高兴的知道这种方法需要用光代替光.国家标准技术研究所的物理学家John Gillaspy说:“这种刻蚀方法使你要重新评价你现在遇到的挑战.”
The National Institute of Standards and Technology and Harvard University are working on a new subtle etching method that uses particle beams instead of light beams. People who are enthusiastic about lithography are also happy to know that this method requires light instead of light. John Gillaspy, a physicist at the Institute of Technology, said: “This method of etching allows you to re-evaluate the challenges you face now.”