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通过X射线衍射及电子探针分析等检测手段介绍了常温快速磷化工艺及其影响因素,所得磷化膜层的结构成分,膜层性能,并提出了改进工艺的设想.
The rapid phosphating process at room temperature and its influencing factors were introduced by means of X-ray diffraction and electron probe analysis. The structural components and film properties of the obtained phosphating coating were also presented. The idea of improved process was also proposed.