论文部分内容阅读
本文采用中频磁控溅射金属Al靶,以CH4为反应气体,通过调整Al靶溅射功率,在p(100)单晶硅片和不锈钢基底上成功制备出不同Al含量的Al/a-C∶H纳米复合薄膜.并利用HR-TEM、XPS、纳米压痕仪和摩擦磨损试验机等手段分析和研究了Al/a-C∶H薄膜的结构、机械及摩擦学性能.结果表明:金属Al以纳米晶颗粒形式镶嵌在非晶碳网络中,使得所制备Al/a-C∶H薄膜呈现出典型的纳米晶/非晶复合结构;同时,Al掺杂促进了薄膜中sp2杂化碳形成,且有效地释放残余内应力.Al靶溅射功率为800 W时所制备的Al/a-C∶H薄膜具有结构致密、内应力低、硬度高的特性;在大气环境中,该薄膜与Si3N4陶瓷球干摩擦时显示出优越的摩擦学性能,其摩擦系数约为0.055,磨损率约为2.9×10-16m3/(N.m).
In this paper, Al metal target with medium frequency magnetron sputtering and CH4 as reaction gas were used to prepare Al / aC:H with different Al contents on p (100) single crystal silicon wafer and stainless steel substrate by adjusting sputtering power of Al target Nanocomposite films were prepared and the structure, mechanical and tribological properties of Al / aC:H thin films were analyzed and studied by means of HR-TEM, XPS, nanoindentation and friction and wear testing machines.The results showed that the metal Al was nanocrystalline In the amorphous carbon network, the Al / aC:H thin films exhibited a typical nanocrystalline / amorphous composite structure. At the same time, Al doping promoted the formation of sp2 hybrid carbon in the films and effectively released Residual internal stress.The Al / aC:H thin film prepared by Al target sputtering power has the characteristics of compact structure, low internal stress and high hardness when the sputter power of Al target is 800 W. In the atmosphere, the dry friction of the film with Si3N4 ceramic ball Excellent tribological properties, the friction coefficient of about 0.055, the wear rate of about 2.9 × 10-16m3 / (Nm).