论文部分内容阅读
外源性或内源性因素介导活性氧(ROS)自由基可引起脱氧核糖核酸(deoxyribonucleic acid,DNA)永久性损伤,表现为DNA结构改变、糖苷脱落及碱基氧化损伤。通过光化学手段介导ROS可以用来模拟生物体内细胞多源代谢诱导DNA氧化损伤特性。该文主要概述了半导体光化学领域近年来的研究概况,介绍了卤氧化铋、纳米TiO2及Fenton等具有代表性的光化学材料介导ROS及光化学氧化性能,重点阐述了光化学介导ROS诱导DNA氧化损伤机制的研究进展,并对ROS诱导DNA氧化损伤研究前景进行展望。
Exogenous or endogenous factors mediate the reactive oxygen species (ROS) free radicals can cause permanent damage of deoxyribonucleic acid (DNA), DNA structure changes, glycoside shedding and base oxidative damage. The photochemical mediated ROS can be used to simulate the multi-source metabolism of cells in vivo to induce DNA oxidative damage. This review summarizes the recent research progress in the field of photochemistry of semiconductors, and introduces the representative photochemical materials such as bismuth oxyhalide, nanometer TiO2 and Fenton to mediate the ROS and photochemical oxidation performance, and focuses on the photochemical mediation of ROS-induced DNA oxidative damage Mechanism of the research progress, and ROS-induced DNA oxidative damage prospects of the study.