掩模自动检查系统提高了大规模集成电路的成品率、性能和可靠性

• 作 者: Daikichi Awayama 拓普选
• 出 处: 半导体设备
• 发表日期: 2004年期
• 关键词: 大规模集成电路 掩模 成品率 可靠性 图形发生器 集成度 检查速度 图形 摄象机 自动配准

在日本,大规模集成电路光刻掩模的缺陷自动检查,现已成为不可缺少的事了。掩模缺陷自动检查设备是四前年投入实际使用的,它的迅速普及已使人们能用到优质的光刻掩模。进而,这又大大提高了大规模集成电路的性能,可靠性和生产成品率。近来,用常规光刻掩模制造高集成度集成电路——超大规模集成电路的可能性也终于得到证实。

In Japan, automatic defect inspection of large scale integrated circuit lithography masks has become an indispensable issue. Automatic mask defect inspection equipment was put into practical use four years ago, its rapid popularity has enabled people to use high-quality lithography mask. This, in turn, greatly increases the performance, reliability, and yield of large scale integrated circuits. Recently, the possibility of using conventional photolithography masks to fabricate highly integrated integrated circuits, very large scale integrated circuits, has finally been confirmed.