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众所周知,硅烷是半导体工业的重要原料,在O_2或空气中的燃烧和SiO_x形成是重要的研究课题。但与之相关的基元反应O(~3P)+SiH_4的动力学则研究得很少。
It is well known that silane is an important raw material in the semiconductor industry. Combustion and SiOx formation in O2 or air are important research topics. However, the kinetics of elementary reaction O (~ 3P) + SiH_4 related to it has been studied very little.