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采用等离子体增强化学气相沉积系统成功制备氟硅共掺杂类金刚石薄膜,采用Raman,XPS对膜层结构与成分进行表征.采用划痕仪对膜层的结合力进行了测试.摩擦测试结果显示,在载荷范围为1~6 N时,膜层具有低摩擦系数(0.05~0.1);在载荷大于6 N时,摩擦系数在0.2~0.27之间.对偶磨斑的光学照片显示,在低载下(1~6 N),磨斑上存在明显的转移膜,转移膜导致膜层具有低摩擦系数;在高载下,磨合期磨斑上存在稳定的转移膜,对应于磨合期的低摩擦系数.然而在磨合期后,磨斑表面转移膜消失,结果导致高摩擦系数.
The fluorine-silicon-codoped diamond-like carbon films were successfully prepared by plasma enhanced chemical vapor deposition (CVD) system. The structure and composition of the films were characterized by Raman and XPS. The adhesion of the films was tested by a scratch tester. , The film has a low coefficient of friction (0.05 ~ 0.1) when the load range is 1 ~ 6 N, and the coefficient of friction is 0.2 ~ 0.27 when the load is greater than 6 N. Optical photographs of dual wear show that in the low load (1 ~ 6 N), there is a clear transfer film on the wear scar, the transfer film leads to a low friction coefficient of the film; under high loading, there is a stable transfer film on the wear spot during the wear-in period, corresponding to the low friction However, after the run-in period, the transfer film on the surface of the freckle disappears, resulting in a high coefficient of friction.