论文部分内容阅读
最近日本工业技术院电子技术综合研究所的电子加工研究室采用大功率二氧化碳激光器,通过陶瓷蒸镀法制造成功超硬质非晶体氮化硼薄膜,它的硬度相当于立方氮化硼。x射线分析表明,这种薄膜是一种非晶体状态的新材料,其内部原子排列结构与立方氮化硼相同,因此具有极高的硬度。立方氮化硼由于硬度接近金刚石,可以用作切削加工中的刀头。这种新型非晶体氮化硼,不仅具有与立方氮化硼相同的硬度,而且涂层处理比立方氮化硼容易得多,因此已经和几家工具制造厂联合进一步深入研究。
Recently, the Japan Institute of Technology Institute of Electronic Technology Electronics Processing Laboratory using high-power carbon dioxide laser, the successful production of ultra-hard non-crystalline boron nitride thin film by ceramic evaporation method, its hardness is equivalent to cubic boron nitride. X-ray analysis shows that this thin film is a new material in an amorphous state and has the same atomic arrangement as cubic boron nitride and therefore has an extremely high hardness. Cubic boron nitride due to the hardness close to the diamond, can be used as cutting tool head. Not only does this new type of amorphous boron nitride have the same hardness as cubic boron nitride, but the coating is much easier to handle than cubic boron nitride and has therefore been further studied in conjunction with several tool builders.