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离子注入工艺,开始用于研制半导体器件,七十年代初才用于金属材料的表面处理, 以提高表面硬度、耐磨性、耐疲劳和耐腐蚀性等。最早将离子注入用于处理各种模具、切削工具、医用手术刀、齿轮、轴承、喷油嘴等,取得了良好效果。我们在试验室对离子注入试样进行了基础性研究之后,选用碳化钨基硬质合金制拉丝模经氮离子注入后,在生产使用现场进行了对比试验。 1.拉丝模的氮离子注入选用了半成品铜线用小拉模和变形量较大的钢丝拉丝模进行试验,拉丝模的材料见表1。
Ion implantation process, began to be used in the development of semiconductor devices, the early seventies only for metal surface treatment, to improve the surface hardness, wear resistance, fatigue and corrosion resistance. The earliest ion implantation for the processing of various molds, cutting tools, medical scalpels, gears, bearings, fuel injectors, and achieved good results. After conducting a basic research on ion-implanted samples in a laboratory, we chose a tungsten carbide-based drawing die to inject nitrogen ions and then conducted a comparative test on the production site. 1. Drawing die nitrogen ion implantation selected semi-finished copper wire with a small drawing die and wire deformation larger wire drawing die test, drawing die material shown in Table 1.