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针对磁控溅射阴极靶磁场分布难以进行定量评价的问题,提出以磁场水平分量Bx的平行率Rk为量化指标,对磁场分布状态进行评价的新方法;采用有限元方法,模拟分析了磁控溅射阴极靶结构参数对磁场分布的影响规律,并利用Rk对结构参数的合理性进行了验证。结果表明,量化指标Rk可以有效地评价磁场分布的优劣,能够为磁场模拟及分析提供基础的科学判据。
Aiming at the problem that it is difficult to quantitatively evaluate the magnetic field distribution of magnetron sputtering cathode target, a new method to evaluate the distribution of magnetic field is proposed based on the parallel ratio Rk of magnetic field horizontal component Bx as a quantitative index. By using the finite element method, Sputtering cathode target structure parameters of the magnetic field distribution of the law, and the use of Rk to verify the rationality of structural parameters. The results show that the quantitative index Rk can effectively evaluate the advantages and disadvantages of the magnetic field distribution and provide the scientific basis for the magnetic field simulation and analysis.