论文部分内容阅读
ArF准分子激光器是实现45nm技术节点光刻的主流光源。综述了准分子激光器的研究现状,介绍了主振荡功率放大(MOPA)与种子注入锁定系统(ILS)双腔结构以及主要波长分离元件,着重介绍了深紫外波长区193nm的光谱线宽压缩技术。
ArF excimer lasers are the dominant light sources for 45nm technology node lithography. The research status of excimer laser is reviewed. The double cavity structure of main oscillating power amplifier (MOPA) and seed injection locking system (ILS) and the main wavelength separation elements are introduced. The 193nm spectral linewidth compression technology in deep ultraviolet wavelength region is emphatically introduced.